File:High-k.svg
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DescriptionHigh-k.svg | Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. | ||||||||
Date | 2006-01-05, 2008-01-14 | ||||||||
Source | File:High-k.png | ||||||||
Author | en:User:Anoopm, traced by User:Stannered | ||||||||
Permission (Reusing this file) |
Anoopm at the English-language Wikipedia, the copyright holder of this work, hereby publishes it under the following license:
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Derivative works of this file: Common SiO2 vs high-k gate stack (DE).svg File:High-k.png |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 18:14, 14 January 2008 | 401 × 235 (8 KB) | Stannered (talk | contribs) | {{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Source=en:Image:High-k.png |Da |
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