File:Wet etching tanks at LAAS 0465.jpg
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| Description |
English: etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS-CNRS technological facility in Toulouse, France.
Français : Bacs de gravure chimique utilisés pour des nettoyages RCA, à l'acide fluorhydrique ou au mélange piranha sur des lots de wafers de 4 pouces à la centrale de technologie du LAAS-CNRS à Toulouse, France. |
| Date | |
| Source | Own work |
| Author | Guillaume Paumier (user:guillom) |
| Permission (Reusing this file) |
Own work, attribution, share-alike: Multi-license with GFDL and Creative Commons CC-BY-SA-3.0 |
| Camera location |  | View this and other nearby images on: OpenStreetMap |  |
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- This work was created by me (Guillaume Paumier). You are free to use it for any purpose as long as you credit me properly.
- Credit line on the web (with hyperlink): Guillaume Paumier, CC-BY.
- Printed publications: guillaumepaumier.com, CC-BY.
- If you use this image outside of Wikimedia projects, I would be happy to hear from you.
- If you use this image in a printed publication, I would love to get a copy for my archives.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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| current | 09:27, 12 November 2007 | | 3,872 × 2,592 (3.48 MB) | Guillom (talk | contribs) | ==Description== {{Information |Description={{en|etching tanks used to perform Piranha, en:Hydrofluoric acid or en:RCA clean on 6-inch wafer batches at fr:LAAS-CNRS technologica |
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