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File:Black silicon on micro-pillars.jpg

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Captions

Captions

Unwanted residues of dry etching

Summary edit

Description
English: Inductively Coupled Plasma - Deep Reactive Ion Etching (ICP-DRIE) of micro-pillars in silicon. If the wrong parameters are used, black silicon (also called grass) is created.
Date
Source Own work
Author Mgerlt

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current14:41, 13 December 2019Thumbnail for version as of 14:41, 13 December 20191,024 × 943 (673 KB)Mgerlt (talk | contribs)User created page with UploadWizard

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