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File:Common SiO2 vs high-k gate stack (DE).svg

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English: Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is a graphical representation of an idea in the presentation by G. E. Moore, Intel Inc.
Deutsch: Vergleich eines konventionellen Gate-Schichtstapel mit Siliziumdioxid als Dielektrikum mit dem eines in High-k+Metal-Gate-Technik (vereinfachte Darstellung) hergestellten Gate-Schichtstapels. Das Schema wurde in Anlehung einer Präsentation von G. E. Moore, Intel Inc., erstellt
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This is a retouched picture, which means that it has been digitally altered from its original version. Modifications: translation to german, thickness ratio fixed, colored. The original can be viewed here: High-k.svg: . Modifications made by Cepheiden.

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This image is a derivative work of the following images:

  • File:High-k.svg licensed with Cc-by-sa-3.0-migrated-with-disclaimers, GFDL-en, GFDL-user-en-note
    • 2008-01-14T18:14:30Z Stannered 401x235 (8539 Bytes) {{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Sourc

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Date/TimeThumbnailDimensionsUserComment
current08:52, 20 February 2010Thumbnail for version as of 08:52, 20 February 2010401 × 235 (7 KB)Cepheiden (talk | contribs)svg fix
08:51, 20 February 2010Thumbnail for version as of 08:51, 20 February 2010401 × 235 (7 KB)Cepheiden (talk | contribs)small fixes
08:45, 20 February 2010Thumbnail for version as of 08:45, 20 February 2010401 × 235 (7 KB)Cepheiden (talk | contribs){{Information |Description={{en|Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is a graphical representation of an idea in the presentation by G. E. Moore, Intel Inc.}} {{de|Vergleich eines konventio

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