File:Comparison positive negative tone resist.svg
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editDescriptionComparison positive negative tone resist.svg |
English: Comparison of positive and negative foto resists Deutsch: Vergleich von Positiv- und Negativlacken bei der Fotolithografie |
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This file was derived from: Vegleich Positiv- und Negativlack.svg: |
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SVG development InfoField | This diagram was created with Inkscape, or with something else. This diagram uses embedded text that can be easily translated using a text editor.
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.http://www.gnu.org/copyleft/fdl.htmlGFDLGNU Free Documentation Licensetruetrue |
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editThis image is a derivative work of the following images:
- File:Vegleich_Positiv-_und_Negativlack.svg licensed with Cc-by-sa-3.0,2.5,2.0,1.0, GFDL
- 2010-02-15T19:06:53Z Cepheiden 600x300 (27934 Bytes) add discription
- 2010-02-15T19:06:07Z Cepheiden 600x300 (27606 Bytes) {{Information |Description={{en|1=Comparison of positive and negative foto resists}} {{de|1=Vergleich von Positiv- und Negativlacken bei der Fotolithografie}} |Source={{own}} |Author=[[User:Cepheiden|Cepheiden]] |Date=2010-02
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 16:02, 19 February 2013 | 600 × 300 (27 KB) | Ki ra li 42 (talk | contribs) | User created page with UploadWizard |
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Height | 300 |