File:EUV photoelectron energy deposition distribution.PNG
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| Description |
English: Ref: M. Kotera et al., Jap. J. Appl. Phys. vol. 47, pp. 4944-4949 (2008). |
| Date | 14 September 2010 (original upload date) |
| Source | Own work |
| Author | User:Guiding light |
The statistical radial distribution of energy deposited by inelastic collision of photoelectrons in resist is plotted. Monte Carlo simulation is used. The energy deposition represents the resist absorption below the surface.
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Attribution: User:Guiding light
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Transferred from en.wikipedia to Commons using For the Common Good.
The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 09:51, 14 September 2010 | 677 × 530 (16,830 bytes) | w:en:Guiding light (talk | contribs) | (Ref: M. Kotera ''et al.'', Jap. J. Appl. Phys. vol. 47, pp. 4944-4949 (2008). The statistical radial distribution of energy deposited by inelastic collision of photoelectrons in resist is plotted. Monte Carlo simulation is used. The energy deposition rep) |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
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| current | 23:54, 23 July 2013 | | 677 × 530 (16 KB) | Addihockey10 (talk | contribs) | Transferred from en.wikipedia: see original upload log above |
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