File:Example growth curves for area-selective atomic layer deposition.png
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Captions
Captions
Example growth curves for area-selective atomic layer deposition with and without etching step
Summary
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| Description |
English: Illustration of film thickness versus cycles in growth area and non-growth area in area-selective atomic layer deposition: (a) without intermittent etching steps and (b) with etching steps in between. |
| Date | |
| Source | Own work |
| Author | Riikka L. Puurunen, J. Ruud van Ommen |
For a scientific perspective article on area-selective ALD, see for example, A.J.M. Mackus, M. J. M. Merkx, W. M. M. Kessels, Chemistry of Materials volume 31, year 2019, pages 2–12; https://doi.org/10.1021/acs.chemmater.8b03454
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 08:00, 21 December 2020 | | 2,840 × 1,149 (379 KB) | Rlpuu (talk | contribs) | Uploaded own work with UploadWizard |
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