File:LOCOS birds beak DE.svg
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editDescriptionLOCOS birds beak DE.svg |
English: Detail cross section at the edge of an isolation windows after a simple LOCOS process. The schematic shows partial growth of Silicon dioxide into the silicon substrate and distortion of the silicon nitrite mask because of volume increase under the mask.
Deutsch: Schnitt an der Kante eines Isolationsfenster nach einem einfachen LOCOS-Prozess. Zusehen ist das teilweise Wachstum in das Silicium-Substrat und die Verbiegung der Siliciumnitritmaske durch die Volumenzunahme auch unter der Maske. |
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Source | Own work |
Author | Cepheiden |
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I, the copyright holder of this work, release this work into the public domain. This applies worldwide. In some countries this may not be legally possible; if so: I grant anyone the right to use this work for any purpose, without any conditions, unless such conditions are required by law. |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 14:04, 17 February 2011 | ![]() | 485 × 326 (5 KB) | Cepheiden (talk | contribs) | fix |
14:01, 17 February 2011 | ![]() | 485 × 326 (5 KB) | Cepheiden (talk | contribs) | typo; thicker nitride film | |
09:47, 17 December 2009 | ![]() | 485 × 326 (9 KB) | Cepheiden (talk | contribs) | small fix | |
07:51, 22 January 2009 | ![]() | 485 × 326 (9 KB) | Cepheiden (talk | contribs) | removed bitmap link | |
22:02, 21 January 2009 | ![]() | 485 × 400 (9 KB) | Cepheiden (talk | contribs) | {{Information |Description={{en|1=Detail cross section at the edge of an isolation windows after a simple LOCOS process. The schematic shows partial growth of Silicon dioxide into the silicon substrate and distortion of the silicon nitrite mask because of |
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