File:Masqueur electronique.GIF
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editDescriptionMasqueur electronique.GIF | "Masqueur électronique", developped nearby 1970 by Jacques Trotel, Thomson-CSF. It was the first e-beam lithography instrument equiped with a laser interferometry. |
Date | |
Source | Archives CAMECA |
Author | Jacques Trotel |
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Cameca |
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This is a copyrighted image from the CAMECA Archives |
Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.http://www.gnu.org/copyleft/fdl.htmlGFDLGNU Free Documentation Licensetruetrue |
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license. | ||
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This licensing tag was added to this file as part of the GFDL licensing update.http://creativecommons.org/licenses/by-sa/3.0/CC BY-SA 3.0Creative Commons Attribution-Share Alike 3.0truetrue |
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current | 10:38, 21 April 2007 | 1,234 × 1,582 (127 KB) | EdC (talk | contribs) | {{Information |Description="Masqueur électronique", developped nearby 1970 by Jacques Trotel, Thomson-CSF. It was the first e-beam lithography instrument equiped with a laser interferometry. |Source=Archives CAMECA |Date=1970 |A |
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