File:Photoelectron trajectories vs dose.png

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English: EUV photoelectron trajectories have more spread with a cumulative increase in dose, leading to a larger number of absorbed photons producing photoelectrons.[1][2]
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Author Guiding light

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References

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  1. Demonstration of Dose-Driven Photoelectron Spread in EUV Resists
  2. M. Kotera et al., "Extreme Ultraviolet Lithography Simulation by Tracing Photoelectron Trajectories in Resist," Jpn. J. Appl. Phys. 47, 4944 (2008).

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current02:45, 9 May 2022Thumbnail for version as of 02:45, 9 May 20221,003 × 224 (21 KB)Guiding light (talk | contribs)aspect ratio of axes
13:49, 6 May 2022Thumbnail for version as of 13:49, 6 May 20221,189 × 231 (25 KB)Guiding light (talk | contribs)Uploaded own work with UploadWizard

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