File:Scheme area selective ALD.png
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Summary
editDescriptionScheme area selective ALD.png |
English: Illustration of area-selective atomic layer deposition (ASALD): (a) surface with chemically dissimilar areas, where ALD growth occurs (growth area) or does not readily occur (non-growth area); (b) surface where a blocking agent has been selectively adsorbed on the non-growth area; and (c) surface after completion of ASALD, where material has grown only on the targeted growth area. If the difference in selectivity between the two areas is large enough, a blocking agent is not needed and step (b) can be skipped.
Based on: A. J. M. Mackus, M. J. M. Merkx, and W. M. M. Kessels, “From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity,” Chem. Mater., vol. 31, no. 1, pp. 2–12, Jan. 2019, doi: 10.1021/acs.chemmater.8b03454. Fenne van Ommen is acknowledged for help with drawing this image. |
Date | |
Source | Own work |
Author | J. Ruud van Ommen, Riikka L. Puurunen |
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current | 05:13, 22 December 2020 | 3,071 × 822 (834 KB) | Jrvanommen (talk | contribs) | Uploaded own work with UploadWizard |
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