File:Semiconductors (5884868648).jpg
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| Description |
Nanotough: Typical low-k film test for material toughness using the new NIST technique. The indentation instrument that punches the triangular hole registers the forces involved. That plus the length of the resulting cracks determines the toughness of the film, which is about 2.4 micrometers thick. (Color added for clarity.) Credit: NIST Disclaimer: Any mention of commercial products within NIST web pages is for information only; it does not imply recommendation or endorsement by NIST. Use of NIST Information: These World Wide Web pages are provided as a public service by the National Institute of Standards and Technology (NIST). With the exception of material marked as copyrighted, information presented on these pages is considered public information and may be distributed or copied. Use of appropriate byline/photo/image credits is requested. |
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| Source | Semiconductors |
| Author | National Institute of Standards and Technology |
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This image is in the public domain in the United States because it is a work of the United States Federal Government, specifically an employee of the National Institute of Standards and Technology, under the terms of Title 17, Chapter 1, Section 105 of the US Code.
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This image was originally posted to Flickr by National Institute of Standards and Technology at https://flickr.com/photos/63059536@N06/5884868648. It was reviewed on 7 September 2016 by FlickreviewR and was confirmed to be licensed under the terms of the United States Government Work. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 02:31, 7 September 2016 | | 501 × 500 (325 KB) | Vanished Account Byeznhpyxeuztibuo (talk | contribs) | Transferred from Flickr via Flickr2Commons |
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