File:Spin-coater for resist coating (DE).svg
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| Description |
English: Schematic representation of a spin-coater tool for photo resist coating, as used in modern coating tools in semiconductor industries. The image shows the main components as well as the photo resist after dispense (1.) and at the end of the process (after rotating the wafer)
Deutsch: Schematische Darstellung einer Anlage zur Rotationsbeschichtung für den Auftrag von Fotolack, wie sie in modernen Anlagen der Halbleiterindustrie genutzt werden. Das Bild zeigt die Hauptkomponenten der Anlage sowie den Fotolack nach der Dosierung (1.) und am Ende des Prozesses (nach dem Rotieren des Wafers) |
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| Source | Own work |
| Author | Cepheiden |
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
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| current | 17:24, 11 May 2011 | | 800 × 600 (23 KB) | Cepheiden (talk | contribs) | {{Information |Description ={{en|1=Schematic representation of a spin-coater tool for photo resist coating, as used in modern coating tools in semiconductor industries. The image shows the main components as well as the photo resist after dispense (1.) |
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