File:Three monolayer concepts relevant to atomic layer deposition.png
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editDescriptionThree monolayer concepts relevant to atomic layer deposition.png |
English: Schematic side-view illustration of three monolayer concepts relevant to atomic layer deposition (ALD): (a) chemisorbed monolayer, which is the basis of ALD growth; (b) physisorbed monolayer, with adsorbed molecules closely packed and with multilayer adsorption on top (can serve as a reference for the maximum obtainable ALD growth per cycle); and (c) a "bulk" monolayer of the ALD-grown MZx material (every third MZx unit highlighted with blue). |
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Date | |||
Source | Own work | ||
Author | Riikka Puurunen | ||
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This image is an updated version of an earlier schematic representation of three monolayer concepts relevant to ALD, which was published in a scientific review article: Puurunen, Journal of Applied Physics, volume 97, article number 121301 (year 2005), Figure 7; https://doi.org/10.1063/1.1940727.
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