File:Three monolayer concepts relevant to atomic layer deposition.png

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Three monolayer concepts: (a) chemisorbed monolayer, (b) physisorbed monolayer (in blue) and (c) monolayer of the deposited material.

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English: Schematic side-view illustration of three monolayer concepts relevant to atomic layer deposition (ALD): (a) chemisorbed monolayer, which is the basis of ALD growth; (b) physisorbed monolayer, with adsorbed molecules closely packed and with multilayer adsorption on top (can serve as a reference for the maximum obtainable ALD growth per cycle); and (c) a "bulk" monolayer of the ALD-grown MZx material (every third MZx unit highlighted with blue).
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Author Riikka Puurunen
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This image is an updated version of an earlier schematic representation of three monolayer concepts relevant to ALD, which was published in a scientific review article: Puurunen, Journal of Applied Physics, volume 97, article number 121301 (year 2005), Figure 7; https://doi.org/10.1063/1.1940727.

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