File:Typical classes of reaction mechanisms in ALD.png
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editDescriptionTypical classes of reaction mechanisms in ALD.png |
English: Illustration of three typical classes of surface reaction mechanisms considered in atomic layer deposition (ALD) for molecule MLn (here: n = 3): (a) ligand exchange reaction, where a gaseous reaction byproduct aL is released; (b) associative adsorption, where a bond is formed between a surface site and the molecule; and (c) dissociative adsorption, where all parts of the MLn molecule are bonded to the surface in a process where bonds are broken and made. Ligand exchange reaction and dissociative reaction can take place further between an adsorbed species and a neighbouring surface site (a.2, c.2). |
Date | |
Source | Own work |
Author | Riikka L. Puurunen |
This image is an updated version of an earlier representation of chemisorption mechanisms identified for ALD, which was published in a scientific review article: Puurunen, Journal of Applied Physics, volume 97, article number 121301 (year 2005), Figure 11; https://doi.org/10.1063/1.1940727.
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current | 10:48, 18 December 2020 | 1,775 × 1,311 (194 KB) | Rlpuu (talk | contribs) | Uploaded own work with UploadWizard |
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