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File:Variation of GPC in ALD vs temperature.png

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Illustration of the ways the growth per cycle (GPC) in atomic layer deposition (ALD) can vary with temperature.

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Description
English: Illustration of the ways the growth per cycle (GPC) in atomic layer deposition (ALD) can vary with temperature: (a) be constant, (b) decrease, (c) increase, (d) decrease or increase in steps, or (e) go through a maximum or a minimum.
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Source Own work
Author Riikka L. Puurunen, J. Ruud van Ommen

This image is an updated version of an earlier representation of the variation of the GPC with temperature within the ALD processing window, which was published in a scientific review article: Puurunen, Journal of Applied Physics, volume 97, article number 121301 (year 2005), Figure 14; https://doi.org/10.1063/1.1940727. Jonna Piironen is thanked for help with drawing this image.

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