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File:Via Triple Patterning for EUV.png

Via_Triple_Patterning_for_EUV.png (211 × 444 pixels, file size: 7 KB, MIME type: image/png)

Captions

Captions

A 38 nm center-to-center distance or less requires triple patterning with EUV.

Summary

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Description
English: At 0.33 NA, a 38 nm center-to-center distance or less requires double or even triple patterning with EUV.[1]
Date
Source Own work
Author Guiding light

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Reference

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  1. ↑ W. Gao et al., Proc. SPIE 11323, 113231L (2020).

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Date/TimeThumbnailDimensionsUserComment
current04:59, 11 December 2021Thumbnail for version as of 04:59, 11 December 2021211 × 444 (7 KB)Guiding light (talk | contribs)added to drawing
01:50, 11 December 2021Thumbnail for version as of 01:50, 11 December 2021301 × 233 (5 KB)Guiding light (talk | contribs)Uploaded own work with UploadWizard

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