File:NDL1088004 歯牙充填学.pdf

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歯牙充填学   (Wikidata search (Cirrus search) Wikidata query (SPARQL)  Create new Wikidata item based on this file)
Author
佐藤, 運雄, 1879-1964
image of artwork listed in title parameter on this page
Title
歯牙充填学
Edition 3版
Publisher
歯科学報社
Language jpn
Publication date

1909

明治42
Place of publication JP
Source

doi:10.11501/1088004

institution QS:P195,Q477675
Creator
InfoField
佐藤運雄 著
Publication Place
InfoField
東京
Subject: NDC
InfoField
497
Extent
InfoField
451, 50p ; 23cm
Material Type
InfoField
Book
Source Identifier: JPNO
InfoField
43005429
Date Digitized: W3CDTF
InfoField
2010-03-31
Audience
InfoField
一般
Title Transcription
InfoField
シガ ジュウテンガク
Publisher Transcription
InfoField
シカ ガクホウシャ
Source Identifier: NDLBibID
InfoField
000000553049
Call Number
InfoField
58-19ニ
Creator Transcription: NDLNA
InfoField
サトウ, カズオ
Creator: NDLNAId
InfoField
00068081
Available: internet
InfoField
2017-08-01
Contents
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標題

目次

第一編 諸論/1

第一章 定義/1

第二章 沿革/2

第三章 適應症/8

第四章 禁忌/12

第二編 充填準備論/15

第一章 齒牙清掃法/15

第二章 防濕法/27

第三章 健態窩洞ノ凖備/47

第一節 窩洞ノ開擴/48

第二節 窩洞ノ剔刮/55

第三節 窩洞ノ消毒/61

第四章 病態窩洞ノ凖備/65

第一節 象牙質知覺過敏ノ處置/66

第二節 露出齒髓ノ處置/87

第三節 發炎齒髓ノ處置/99

第四節 腐敗齒髓ノ處置/123

第五節 發炎齒膜ノ處置/156

第六節 齒槽膿瘍ノ處置/165

第七節 齒槽膿漏ノ處置/179

第八節 變色齒ノ處置/186

第五章 凖備小手術/210

第一節 齒間分離法/210

第二節 齒齦排除法/217

第三節 窩洞裏裝法/220

第四節 隔壁法/226

第三編 充填術式論/239

充填術式通論/240

第一章 窩洞ノ形成法/240

第二章 窩洞ノ填塞法/261

第三章 研磨法/286

充填術式各論/295

第一章 露出面單純窩洞/296

第二章 咬合面單純窩洞/302

第三章 隣接面單純窩洞/312

第四章 前齒隅角複雜窩洞/326

第五章 前齒截端消耗性複雜窩洞/334

第六章 前齒唇面隣接面窩洞/337

第七章 前齒舌面隣接面窩洞/339

第八章 隣接面咬面窩洞/340

第九章 頬咬面及舌咬面窩洞/355

第四編 充填材料論/359

第一章 黄金/361

第二章 錫/376

第三章 アマルガム/379

第四章 セメント/396

第五章 倔答百兒加/405

第七章 連合充填及混合充填/411

第八章 鑲篏術/420

附録 診査要項

Licensing

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Public domain
According to Japanese Copyright Law (June 1, 2018 grant) the copyright on this work has expired and is as such public domain. According to articles 51, 52, 53 and 57 of the copyright laws of Japan, under the jurisdiction of the Government of Japan works enter the public domain 50 years after the death of the creator (there being multiple creators, the creator who dies last) or 50 years after publication for anonymous or pseudonymous authors or for works whose copyright holder is an organization.

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